A formation mechanism of nanocrystalline cerium dioxide (CeO2), a versatile nanomaterial, has been unveiled. This finding potentially simplifies and alleviates the existing synthetic processes of ...
In an article published in Scientific Reports, researchers examined a relatively unknown cerium dioxide (CeO 2) nanoparticle’s antiviral potential. The ability of two nano-CeO 2 with opposite surface ...
In semiconductor manufacturing, a process called chemical mechanical planarization (CMP) is used for polishing wafer surfaces. CMP uses a slurry that contains both functional chemicals and ...
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